Figure 1. Preparation of hydrophilic mercaptosilane-coated SiNC and mSiNC. (A–C) Schemes for chemical etching of the silicon wafer to produce fluorescent SiNCs on the wafer surface (wSiNCs; A), mercaptosilane coating of the wafer (wmSiNCs; B), and removing nanocrystals by mechanical scraping, to produce mercaptosilane-coated SiNCs dispersed in water (mSiNCs; C). These mSiNCs were then purified by Superdex 75 gel filtration HPLC.
Figure 1.

Preparation of hydrophilic mercaptosilane-coated SiNC and mSiNC. (A–C) Schemes for chemical etching of the silicon wafer to produce fluorescent SiNCs on the wafer surface (wSiNCs; A), mercaptosilane coating of the wafer (wmSiNCs; B), and removing nanocrystals by mechanical scraping, to produce mercaptosilane-coated SiNCs dispersed in water (mSiNCs; C). These mSiNCs were then purified by Superdex 75 gel filtration HPLC.

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